CHIPS 2020 VOL. 2 by Bernd Hoefflinger
Author:Bernd Hoefflinger
Language: eng
Format: epub
Publisher: Springer International Publishing, Cham
Table 8.2Electrical power (kW) for 32 nm lithography in a 150-MW Gigafactory for 130,000 12 in. wafers/month (HVM: High-volume manufacturing) [1]
kW
Immer scanner
EUV HVM
MEB HVM
Supplier estimate
Supplier estimate
30 mJ/cm2 instead of 10 mJ/cm2
30 mJ/cm2 resist + conservative collector and source efficiencies
Ten 10 wph columns
Share datapath
Source
89
580
1740
16,313
120
120
Exposure unit
130
169
190
190
Datapath
250
53
Total per tool
219
749
1930
16,503
370
173
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